Laser damage resistance of hafnia thin films deposited by electron beam deposition, reactive low voltage ion plating, and dual ion beam sputtering
Sun, 2007-12-16 23:33 — Guest
Laurent Gallais, Jérémie Capoulade, Jean-Yves Natoli, Mireille Commandré, Michel Cathelinaud, Cian Koc, Michel Lequime
A comparative study is made of the laser damage resistance of hafnia coatings deposited on fused silica substrates with different technologies: electron beam deposition (from Hf or HfO_2 starting material), reactive low voltage ion plating, and dual ion beam sputtering.
The laser damage thresholds ... [Appl. Opt. 47, C107-C113 (2008)]
- Feed: Applied Optics
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